EIPBN 2011
First Call For Papers

The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
May 31 – June 3, 2011, JW Marriot Resort, Las Vegas, Nevada
The World's Leading Symposium on Lithography and Nanofabrication
EIPBN — the ‘THREE-BEAMS’ conference — is recognized as the premier conference dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends.


On behalf of the organizing committee it is my pleasure to announce the first call for papers for the conference. 
Abstract Submission: January 10 2011
Registration: Open from January 2011
Abstract submission details and further information about the conference can be found at:


Abstracts representing high-quality original research are invited in the following areas:
Micro- and Nanolithography
·         Electron-beam lithography
·         Ion-beam patterning
·         Optical lithography
·         Nano-imprint lithography
·         Extreme UV lithography
·         Masked and maskless lithography
·         Directed self-assembly
·         Novel or emerging lithographic techniques
Process Technologies
·         Electron or ion beam technologies
·         Metrology and imaging
·         Resists
·         Pattern transfer
·         Process simulation and modeling
·         Novel beam-based processing
·         Nanoelectronics
·         Patterned media and data storage
·         Nanophotonics
·         Nanobiology
·         Micro- and nano-fluidics
·         Novel or emerging applications
We look forward to seeing you in Las Vegas!
Richard Blaikie
Program Chair

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