EIPBN 2011
First Call For Papers

The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
www.eipbn.org
May 31 – June 3, 2011, JW Marriot Resort, Las Vegas, Nevada
The World's Leading Symposium on Lithography and Nanofabrication
EIPBN — the ‘THREE-BEAMS’ conference — is recognized as the premier conference dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends.

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On behalf of the organizing committee it is my pleasure to announce the first call for papers for the conference. 
 
Deadlines:
Abstract Submission: January 10 2011
Registration: Open from January 2011
 
Abstract submission details and further information about the conference can be found at:
 

www.eipbn.org

 
Abstracts representing high-quality original research are invited in the following areas:
 
Micro- and Nanolithography
·         Electron-beam lithography
·         Ion-beam patterning
·         Optical lithography
·         Nano-imprint lithography
·         Extreme UV lithography
·         Masked and maskless lithography
·         Directed self-assembly
·         Novel or emerging lithographic techniques
Process Technologies
·         Electron or ion beam technologies
·         Metrology and imaging
·         Resists
·         Pattern transfer
·         Process simulation and modeling
·         Novel beam-based processing
Applications
·         Nanoelectronics
·         Patterned media and data storage
·         Nanophotonics
·         Nanobiology
·         Micro- and nano-fluidics
·         Novel or emerging applications
 
We look forward to seeing you in Las Vegas!
 
Richard Blaikie
Program Chair
 



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